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Solar wafer cleaning machines

Solar wafer cleaning machines
company Beijing Golden Eagle Electronic Equipment Co.,Ltd
Update2011-04-01
Original RegionChina
Solar wafer cleaning machines
Solar wafer cleaning machines
1. Process
Loop deionized water pre-wash cycle deionized water pre-wash cleaning processing processing Cleaning loop deionized water rinse loop deionized water rinse drying
二. Equipment performance characteristics
(1) The device is the German import PVC plates welded together, appearance, performance and acid-resistant, easy to operate.
(2) the standard mode of transportation design, wafer cleaning can be all-round applicable to continuous production.
(3) wafer cleaning machines equipped with highly efficient screening program, the work area to meet the purification work (1000 ~ 100, 10 for premium).
(4) man-machine interface for the touch screen, a security fault code, fault alarm, convenient operation, easy to maintain.
三. Slot allocation method
In the washing tank by adding 80% deionized water, weighed by adding 2 to 4% of the EC-35-10-type silicon wafer cleaning agent, it is recommended to add 0.2 to 0.4% potassium hydroxide reagent (potassium hydroxide and cleaning agent 1:10 consumption can be added), at the same time, and then adding deionized water to the working level, and uniform mixing, heating to operating temperature ,open the motor to start to clean.

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