Solar wafer cleaning machines
Solar wafer cleaning machines
1. Process
Loop deionized water pre-wash cycle deionized water pre-wash
cleaning processing processing Cleaning loop deionized water rinse
loop deionized water rinse drying
二. Equipment performance characteristics
(1) The device is the German import PVC plates welded together,
appearance, performance and acid-resistant, easy to operate.
(2) the standard mode of transportation design, wafer cleaning can
be all-round applicable to continuous production.
(3) wafer cleaning machines equipped with highly efficient
screening program, the work area to meet the purification work
(1000 ~ 100, 10 for premium).
(4) man-machine interface for the touch screen, a security fault
code, fault alarm, convenient operation, easy to maintain.
三. Slot allocation method
In the washing tank by adding 80% deionized water, weighed by
adding 2 to 4% of the EC-35-10-type silicon wafer cleaning agent,
it is recommended to add 0.2 to 0.4% potassium hydroxide reagent
(potassium hydroxide and cleaning agent 1:10 consumption can be
added), at the same time, and then adding deionized water to the
working level, and uniform mixing, heating to operating temperature
,open the motor to start to clean.

